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cited by 24
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Method for manufacturing semiconductor structure from the source record
Cited by the examiner during prosecution
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Plasma generator and film forming method employing same from the source record
Cited by the examiner during prosecution
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Fabrication of photovoltaic cell by plasma process from the source record
Cited by the applicant
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Production apparatus of semiconductor layer employing DC bias and VHF power from the source record
Cited by the examiner during prosecution
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Method and arrangement for plasma boronizing from the source record
Cited by the applicant
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Plasma boronizing from the source record
Cited by the examiner during prosecution
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Method for manufacturing semiconductor structure from the source record
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Plasma generating device and film deposition method in which the plasma generating device is used from the source record
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Deposited Film Forming Method, Deposited Film Forming Device, Deposited Film, and Photosensitive Member Provided with the Deposited Film from the source record
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Deposition of semiconductor layer by plasma process from the source record
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Plasma boronizing from the source record
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Method of growing an amorphous silicon film from the source record
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Process for carburizing carburisable work pieces under the action of plasma-pulses from the source record
Cited by the examiner during prosecution
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Apparatus for selective chemical vapor deposition of dielectric, semiconductor and conductive films on semiconductor and metallic substrates from the source record
Cited by the examiner during prosecution
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Process for deposition of a protective coating based on amorphous diamond pseudocarbon or on modified silicon carbide from the source record
Cited by the examiner during prosecution
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Thin film capacitor and apparatus for manufacturing same from the source record
Cited by the examiner during prosecution
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Process and apparatus for coating a substrate in a plasma from the source record
Cited by the examiner during prosecution
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Process for preparation of semiconductor device from the source record
Cited by the examiner during prosecution
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Controlled process for the production of thermal energy from gases and apparatus useful therefor from the source record
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Process and apparatus for depositing hydrogenated amorphous silicon on a substrate in a plasma environment from the source record
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Plasma deposition of amorphous metal alloys from the source record
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Controlled Process For The Production Of Thermal Energy From Gases And Apparatus Useful Therefore from the source record
Cited by the examiner during prosecution
References
cites 5
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Method of depositing uniform films of Six Ny or Six Oy in a plasma reactor from the source record
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Method of forming semiconducting materials and barriers from the source record
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Process for depositing elemental silicon semiconductor material from a gas phase from the source record
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Method of powder activation from the source record
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Producing rod-shaped semiconductor crystals from the source record