patent · EP0263788A1
Process and apparatus for depositing hydrogenated amorphous silicon on a substrate in a plasma environment
13 April 1988
Indexed reference — no copy held
This patent is cited by material in the archive, so it is indexed here by number, title and inventor. The archive holds no copy of its text.
Provenance
- Collection
- Patents citing this work
- Patent office record
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- Source
- Google Patents citing-documents table
- Assignee
- Institut De Microtechnique
- Published
- 1988-04-13