patent · US7144826
Method and apparatus for the production of process gas that includes water vapor and hydrogen formed by burning oxygen in a hydrogen-rich environment
5 December 2006
Indexed reference — no copy held
This patent is cited by material in the archive, so it is indexed here by number, title and inventor. The archive holds no copy of its text.
Abstract
The aim of the invention is the simple and economical production of a hydrogen-rich process gas from water vapour and hydrogen, whereby the proportion of water vapour to hydrogen may be precisely controllable and reproducible. Said aim is achieved, with a method and device for the production of a process gas for the treatment of substrates, in particular semiconductor substrates, in which the oxygen for formation of a process gas, comprising water vapour and hydrogen, is burn...
Provenance
- Collection
- Cited prior art
- Original PDF
- patentimages.storage.googleapis.com →
- Filed
- 2002-04-19
- Source
- Google Patents bibliographic record
- Granted
- 2006-12-05
- Inventors
- Georg Roters; Roland Mader; Helmut Sommer; Genrih Erlikh; Yehuda Pashut; Mattson Thermal Products GmbH